The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 13, 2001

Filed:

Dec. 22, 1998
Applicant:
Inventors:

Seiichi Kataoka, Ikeda, JP;

Susumu Yoshikawa, Ikeda, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05D 5/00 ;
U.S. Cl.
CPC ...
B05D 5/00 ;
Abstract

Provided is a method for modifying one surface of a textile fabric or a nonwoven fabric, which comprises coating a sizing agent inactive to plasma treatment on one surface of a hydrophobic or hydrophilic textile fabric or nonwoven fabric, subjecting another surface of the textile fabric or the nonwoven fabric to low-temperature plasma treatment to form an active seed for a graft polymerization reaction, then graft-polymerizing this active seed with a polymerizable monomer, and thereafter removing the sizing agent coated on one surface of the textile fabric or the nonwoven fabric. Clothing in which sweat given in sports or the like can easily be shifted from one surface to another thereof and can easily be evaporated and which has wash and wear properties is obtained.


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