The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 13, 2001

Filed:

Dec. 17, 1997
Applicant:
Inventors:

Curtis Bobby Motley, West Chester, OH (US);

Robert Michael Schraer, Fairfield, OH (US);

Christina Marie Troyan, Fairfield, OH (US);

Assignee:

The Procter & Gamble Company, Cincinnati, OH (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61K 7/32 ;
U.S. Cl.
CPC ...
A61K 7/32 ;
Abstract

Disclosed are anhydrous antiperspirant cream compositions that have improved wash-off performance and good antiperspirant efficacy, which compositions have a penetration force value of from about 75 gram·force to about 500 gram·force, a delta stress value of from about 300 dyne/cm,to about 8,000 dyne/cm,as measured after extrusion of the composition through a shear force delivery means, and a static yield stress value of at least about 1,000 dyne/cm,as measured after extrusion of the composition through a shear force delivery means. These compositions comprise from about 0.1% to about 20% by weight of a crystalline gellant, from about 10% to about 80% by weight of an anhydrous liquid carrier for the crystalline gellant wherein the anhydrous liquid carrier has a solubility parameter of from about 3 to about 13, from about 5% to about 35% by weight of a particulate antiperspirant active, and from about 0.001% to about 5% by weight of an anhydrous liquid surfactant which is selected from the group consisting of nonionic surfactant, amphoteric surfactant, and combinations thereof. Also disclosed are methods of using and making the compositions.


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