The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 06, 2001
Filed:
Nov. 09, 1999
Sung-min Cho, Seoul, KR;
Won-hyung Lee, Seoul, KR;
Hwan-young Choi, Anyang, KR;
Moon-gyu Lee, Suwon, KR;
Jee-hong Min, Yongin, KR;
Young-il Kim, Yongin, KR;
Jin-seung Choi, Suwon, KR;
Jae-yong Eum, Suwon, KR;
Samsung Electronics., Ltd., Kyungki-Do, KR;
Abstract
A diffractive deflection beam scanning system including: a plurality of light sources; a deflection disc rotatably mounted over the light sources, having patterns capable of diffracting and deflecting beams emitted from the light sources; a plurality of first reflecting mirrors for changing the traveling paths of beams diffracted and deflected by the deflection disc; a plurality of second reflecting mirrors for reflecting the beams reflected by the first reflecting mirrors in a beam scan direction, wherein the light sources are disposed in a straight line along a bisecting line of the deflection disc, perpendicular to the beam scan direction, and the second reflecting mirrors are arranged over the center of the deflection disc at different heights.