The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 06, 2001

Filed:

Feb. 09, 1999
Applicant:
Inventors:

Carlos A. Durán, San Diego, CA (US);

Rui-Fang Shi, Carlsbad, CA (US);

Assignee:

Phase Metrics, Inc., San Diego, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 1/102 ; G01N 2/141 ; G01N 2/143 ;
U.S. Cl.
CPC ...
G01B 1/102 ; G01N 2/141 ; G01N 2/143 ;
Abstract

An apparatus that can measure a space between a first surface and a second surface. The apparatus may include a light source that can reflect a light beam from the first and second surfaces. A birefringent element may split the reflected light beam into an ordinary beam and an extraordinary beam. The ordinary and extraordinary beams are detected by a photodetector. The apparatus may include a controller that is coupled to the photodetector and which can compute the space from a phase value that is determined from data collected when the mechanism varies the phase between the ordinary and extraordinary beams, and a ratio between a first modulation amplitude detected from light reflected from the first and second surfaces and a second modulation amplitude detected from light reflected from the first surface when the second surface is not adjacent to the first surface. The ratio can also be used to compute the reflectance and index of refraction of the second surface. This method thus allows the space to be computed without performing a separate measurement to determine the index of refraction.


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