The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 06, 2001
Filed:
Nov. 19, 1998
Michel G. M. Perbost, Cupertino, CA (US);
Roy H. Kanemoto, Palo Alto, CA (US);
Agilent Technologies Inc., Palo Alto, CA (US);
Abstract
A wash reagent employed for the bulk washing of the surface of a high-density array to remove unreacted reactants from cells of the array while, at the same time, reacting with the unreacted monomer in order to prevent reaction of the reacted monomer with functional groups on the surface of the HDA outside of the region of the surface to which the reactive monomer is applied. The wash reagent is chosen for a particular solid-state synthesis so that the unreacted reactants and catalyzing agents are soluble in the wash reagent, so that the wash reagent does not react with, or catalyze, reactions of the substrate or the biopolymers bound to the substrate, and so that the wash reagent reacts with unreacted reactive monomer in order to prevent subsequent reactions of the unreacted reactive monomer.