The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 06, 2001
Filed:
May. 24, 1999
Biing-Seng Wu, Jen Te, TW;
Chi Mei Electronics Corp., Taipei, TW;
Abstract
A method of forming a TFT-LCD with self-aligned transparent conducting layer over a substrate comprises the following steps. Initially, a first metal layer is formed on the substrate. Then, an insulating layer is formed on the substrate. A silicon layer is formed above the insulator layer. A doped silicon layer is formed above the silicon layer. A second metal layer is formed on the doped silicon layer, the silicon layer, and the substrate to define S/D structures and data lines. Then, a passivation layer is formed on the second metal layer, the silicon layer, and the insulating layer. A transparent conducting layer is formed on the passivation layer. Then, a negative photoresist is formed on the transparent conducting layer. A front-side exposure step is performed by using a first photomask. Additionally, a back-side exposure step is performed by using the first metal layer and the second metal layer as a mask. After removing the unexposed negative photoresist, an etching step is performed to define the transparent conducting layer.