The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 06, 2001
Filed:
Jun. 15, 1993
Applicant:
Inventors:
Tom Feng, Hopewell Junction, NY (US);
Joel Askinazi, Trumbull, CT (US);
Assignee:
Raytheon Company, Lexington, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 1/706 ;
U.S. Cl.
CPC ...
B32B 1/706 ;
Abstract
Method for producing novel diamond bodies having near-surface areas of reduced index of refraction which act as an anti-reflection layer. The method comprises displacing some of the ions present in the diamond lattice structure at said areas with preselected ions, such as of C, Si, Fe, Ni, Ti or Au, by ion implantation means to produce desired optical properties, such as for lens coatings. The ion-implanted diamond body preferably is subjected to high temperature post-annealing.