The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 06, 2001
Filed:
Sep. 25, 1998
Adel Issa Nazzal, San Jose, CA (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method and system are disclosed for detecting the end-point of an etching cycle utilizing an etching device, sensor strips, and one or more resistance measuring devices. First, one or more sensor strips are deposited onto a substrate material. Resistance measuring devices are electrically connected to the sensor strips. Thereafter, the sensor strips residing on the substrate material are etched alongside product material. As each sensor strip is etched, its resistance will increase in a predictable manner with respect to the amount of material eroded from its surface. The resistances of the sensor strips are measured in real time over the duration of the etching cycle. Finally, the resistances measured by the resistance measuring devices are used to track etch depth in real time, enabling the etch device operator to determine the precise point in time at which the end-point has been reached and the cycle should be terminated.