The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 06, 2001
Filed:
May. 18, 1999
Won-sung Choi, Kyungki-do, KR;
Kyu-un Oh, Kyungki-do, KR;
IPS Ltd., , KR;
Abstract
An apparatus for depositing thin films on a semiconductor wafer. The thin film deposition apparatus includes a reactor block receiving a semiconductor wafer; a shower head plate covering the reactor block to maintain the internal pressure of the reactor block at a predetermined level; a reaction gas supply connected to the shower head plate, for supplying reaction gases; an inert gas supply connected to the shower head plate, for supplying an inert gas; an exhaust portion connected to the reactor block, for exhausting the gases out of the reactor block; and a diffusion plate installed in the shower head plate, having a plurality of passages connected to the source of inert gas supply, a plurality of nozzles connected to the passages, the inert gas sprayed through the nozzles lowering a wall of inert gas along the inner wall of the reactor block, and a plurality of spray holes, the reaction gases spread over the wafer through the spray holes.