The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 30, 2001

Filed:

Dec. 29, 1997
Applicant:
Inventors:

Louis William Adams, Jr., Inman, SC (US);

Steven Wayne Cox, Chesnee, SC (US);

Assignee:

Milliken & Company, Spartanburg, SC (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/00 ;
U.S. Cl.
CPC ...
G06K 9/00 ;
Abstract

This invention relates to an image processing method whereby large scale patterning artifacts in a pattern comprised of a large number of pattern repeats can be detected by processing a single pattern repeat and, if desired, the method can be used to modify the pattern repeat to render such artifacts less visually obtrusive.


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