The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 30, 2001
Filed:
Aug. 04, 1997
John F. Harris, Boulder, CO (US);
Georgene M. Nielsen, Westminster, CO (US);
Dan William Quintana, Louisville, CO (US);
Quantum Corporation, Milpitas, CA (US);
Abstract
An improved transverse pressurization contour (TPC) slider and method for manufacturing the same in which the TPC surfaces occupy more than 50% of the slider rail surfaces. The rail widths may be defined by a shallow etching step in conjunction with a deeper central saw cut defining an ambient pressure slot. Alternatively, the rail widths may be defined by multiple saw cuts. The air bearing surfaces (ABS) may be defined in a single photolithographic step. Utilizing TPC surfaces of greater than 50% of the rail surfaces allows the use of saw cuts to define the rail dimensions and ambient pressure slot with decreased sensitivity to lateral mispositioning of the cuts. The improved TPC slider and method for manufacturing the same provides a simplified, reproducible device and process which is much more rapidly effectuated than processes relying on conventional chemical etching, reactive ion etching or ion milling operations. Also in accordance with a process of the present invention, leading edge ramps of the rails may be advantageously formed prior to definition of the air bearing surfaces and transverse pressurization contours.