The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 30, 2001
Filed:
Oct. 20, 1999
Applicant:
Inventors:
Douglas McLean, Los Gatos, CA (US);
Bernard Feldman, Watsonville, CA (US);
Assignee:
Feldman Technology Corporation, Watsonville, CA (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23F 1/16 ;
U.S. Cl.
CPC ...
C23F 1/16 ;
Abstract
Masked tin oxide films are etched with an etchant composed of a zinc metal, an acid and a Ni,penetration control agent. The exposed metal oxide film is reduced to metallic tin by the action of active hydrogen (H,) produced in the reaction of zinc with acid, and etching stops when the metallic tin becomes impenetrable to H,.
McLean, Douglas. (2001). Method for etching (U.S. Patent No. 6180021). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6180021
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile