The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 30, 2001
Filed:
Jun. 15, 1998
Seiko Epson Corporation, , JP;
Abstract
A new drying method and apparatus is provided for drying a semiconductor device substrate, a liquid crystal panel substrate, or the like, which can reduce the possibility of contamination during drying, reduce facility costs and the area required for setting the facilities, and can perform drying in batches. Of the four sides of the upper end of the pull-up bath,two of the sides that oppose each other have a smaller height than the remaining two sides, and form overflow portions,where water in the pull-up bath overflows into a drainage bath,A rod-shaped heater,is mounted to the inside of the pull-up bath,and a heater cover,is disposed above the heater,with a pair of exhaust tubes,being led out to a location above the pull-up bath,so as to allow discharge of gas to the outside therefrom. A water supply tube,is connected to the bottom surface of the pull-up bath,to allow ultra-pure water to be supplied from a water supply system to be described later. A drainage tube,is connected to the lower portion of the drainage bath,as well as to a water supply control device,composed of a circulating pump, a change-over valve, or the like.