The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 23, 2001
Filed:
Aug. 02, 1999
Loren K. Gibbons, Pointe aux Pins, MI (US);
Chen-Youn Sue, Williamstown, WV (US);
Jeffrey Silloway, Marietta, OH (US);
Jason J. Miller, Cutler, OH (US);
Michael J. Hanner, Marietta, OH (US);
Seldon L. Dotson, Parkersburg, WV (US);
Chevron Chemical Company LLC, San Francisco, CA (US);
Abstract
In the present invention, a process is provided for producing high impact polystyrene of improved heat resistance. According to the invention, after phase inversion of the rubber-polystyrene system, a slurry of PPE in styrene is added in situ to the process. The PPE slurry in styrene contains greater than 15 wt. % of PPE and is introduced to the process at point past rubber phase inversion, preferably at point where total polymer solids is greater than 40 wt. % of the total weight of the polymerization mixture. Preferably, four continuous stirred tank reactors in series are used in the process and preferably the slurry of PPE in styrene monomer is introduced to the third CSTR.