The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 23, 2001
Filed:
Jun. 03, 1998
Applicant:
Inventor:
Hiroki Koga, Tokyo, JP;
Assignee:
NEC Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 2/176 ;
U.S. Cl.
CPC ...
H01L 2/176 ;
Abstract
In order to provide a method for manufacturing a semiconductor device in which, in a trench isolation process of the semiconductor device, any void is not formed in trenches and a repeating pitch of the trench isolation can be reduced to the limitations of a lithography technique, the method of the present invention comprises, in the trench isolation process, a step of etching a silicon substrate through a hard mask to form trenches, and a step of processing the hard mask so that its upper portion may be tapered.