The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 23, 2001
Filed:
Jul. 14, 1998
Anastasios P. Melisaris, Stevenson Ranch, CA (US);
Thomas H. Pang, Castaic, CA (US);
Vantico Inc., Brewster, NY (US);
Abstract
The present invention relates to a process for the production of three-dimensional articles by stereolithography using a radiation-curable composition containing a mixture of at least one cationically polymerizable compound and/or at least one free radical polymerizable compound, at least one filler material, at least one photoinitiator for cationic and/or radical polymerizations and at least one antisedimentation agent. An organic viscosity stabilizer material soluble in the base resin may optionally be brought into contact with the composition. A filler material can be introduced in the composition in an effective amount sufficient to at least delay or prevent a significant viscosity increase. The present invention also relates to cured articles resulting from said processes and a process for preparing said compositions.