The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 23, 2001
Filed:
May. 10, 1999
Marten Walther, Engelstadt, DE;
Wolfgang Möhl, Worms, DE;
Burkhard Danielzik, Ingelhelm, DE;
Markus Kuhr, Wöllstein, DE;
Roland Hochhaus, Mainz, DE;
Hartmut Bauch, Weilrod, DE;
Martin Heming, Stromberg, DE;
Thomas K{umlaut over (u)}pper, Bad Gandersheim, DE;
Lars Bewig, Bad Gandersheim, DE;
Carl-Zeiss-Stiftung, , DE;
Abstract
The invention concerns a plasma CVD system (in particular a plasma pulse CVD system) with an array of microwave antennas. According to the invention, in order to improve the homogeneity of the layer, interference is prevented by controlling adjacent antennas in a chronologically offset manner. To that end, microcapsules are provided within the macrocapsules of the plasma pulse CVD process. Additionally, the uniformity of the layer deposition at the interfaces between adjacent modules can be optimized by radio-frequency excitation by means of suitable electrodes, magnetic fields or the configuration of the gas inlets. The surface coated in an operating cycle can thus be scaled as required.