The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 23, 2001
Filed:
Jun. 18, 1999
Christopher Lee Pike, Fremont, CA (US);
Vincent Lani Marinaro, Sunnyvale, CA (US);
Advanced Micro Devices, Inc., Sunnyvale, CA (US);
Abstract
A method and system for measuring a fluid in a photolithography track is disclosed. The method includes dispensing the fluid in a photolithography track into a self-contained reservoir, and measuring the volume of the fluid using the self-contained reservoir. In a preferred embodiment, the reservoir receives the fluid from the dispenser through a drain pipe. By measuring the volume of fluid in this manner, spillage of fluid is prevented because the volume measuring apparatus in accordance with the present invention is self-contained. This prevents corrosion and other damage to the parts of the photolithography track which come into contact with the spilled fluid. With no spillage, a more consistent volume measurement is obtained. The volume measurement is also much quicker to perform than conventional methods.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile