The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 16, 2001
Filed:
May. 20, 1999
Michael Liehr, Feldatal, DE;
Leybold Systems GmbH, Hanau, DE;
Abstract
A device for producing plasma in a vacuum chamber (,) with the help of electromagnetic alternating fields, in which a rod-shaped conductor (,) that is inside a pipe (,) and is made of an insulating material and is guided into the vacuum chamber (,). The inner diameter of the insulating pipe (,) is larger than the diameter of the conductor (,). The insulating pipe (,) is held in the wall (,) of the vacuum chamber (,) at one end, and its outer surface is sealed across from the vacuum chamber wall. The conductor (,) is connected to a source (,) for producing the electromagnetic alternating field. A pipe-shaped conductor (,) extends coaxially to the rod-shaped conductor (,) in the annulus formed by the rod-shaped conductor (,) and the insulating pipe (,), whereby the radial inner ring slot (,) formed between the rod-shaped conductor (,) and the pipe-shaped conductor (,) corresponds to the waveguide (,) of the source (,). The radial outer ring slot (,) formed by the insulating pipe (,) and the pipe-shaped conductor (,) is connected to the waveguide (,′) of a second source (,).