The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 09, 2001

Filed:

Jan. 19, 2000
Applicant:
Inventors:

Kent J. Evans, Lima, NY (US);

Kathleen M. Carmichael, Williamson, NY (US);

James B. O'Leary, Rochester, NY (US);

Damodar M. Pai, Fairport, NY (US);

Donald P. Sullivan, Rochester, NY (US);

Markus R. Silvestri, Fairport, NY (US);

James C. Lamy, Rochester, NY (US);

Assignee:

Xerox Corporation, Stamford, CT (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03G 5/047 ;
U.S. Cl.
CPC ...
G03G 5/047 ;
Abstract

An electrophotographic imaging member is improved in light shock resistance by including in the charge transport layer a light shock resisting additive of triethanolamine, morpholine, an imidazole or mixtures thereof. The imaging member preferably has a charge generating layer containing hydroxygallium phthalocyanine, alkoxygallium phthalocyanine and mixtures thereof as the photogenerating particles. The method of rendering an imaging member including such a charge generating layer acceptably resistant to light shock includes forming a charge transport layer in association with the charge generating layer to contain the light shock resisting additive of triethanolamine, morpholine, an imidazole or mixtures thereof.


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