The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 09, 2001
Filed:
Mar. 15, 1999
Applicant:
Inventors:
Tsung-Ho Lee, Ping Tong Hsien, TW;
Tsui-Ping Yeh, KaoHsung, TW;
Assignee:
Eternal Chemical Co., Ltd., , TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09G 1/02 ;
U.S. Cl.
CPC ...
C09G 1/02 ;
Abstract
The invention provides a chemical-mechanical abrasive composition for use in semiconductor processing, which comprises 70-95% by weight of an aqueous medium, 1-25% by weight of an abrasive, 0.1-20% by weight of an abrasion accelerator, wherein the abrasion accelerator comprises monocarboxy group- or an amido group-containing compound and optionally a nitrate salt. The chemical-mechanical abrasive composition of the invention can further comprise an anionic surfactant, e.g. polycarboxylic acid or polyacrylic acid copolymer, so as to reduce the viscosity of the abrasive composition.