The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 09, 2001
Filed:
Jan. 14, 2000
Adriaan F. M. Leenaars, Eindhoven, NL;
Jacques J. Van Oekel, Eindhoven, NL;
U.S. Phillips Corporation, New York, NY (US);
Abstract
Apparatus for treating substrates, such as silicon wafers (,), wherein the substrates are immersed for some time in a bath (,) containing a liquid (,) and are taken therefrom so slowly that practically all of the liquid remains in the bath (,). The substrates (,) are brought from the liquid (,) directly into contact with a vapor of an organic solvent which is mixed with a carrier gas and introduced from gas leads (,) having outlet nozzles (,). The vapor is miscible with the liquid (,) to yield a mixture having a surface tension lower than that of the liquid, and which does not condense on the substrates. No drying marks with organic or metallic residues or other contaminations remain on the substrates (,).