The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 02, 2001
Filed:
Mar. 05, 1999
Karl Heinz Schuster, Königsbronn, DE;
Carl-Zeiss-Stiftung, Heidenheim, DE;
Abstract
The invention is directed to a catadioptric microlithographic reduction objective having two concave mirrors (,) facing toward each other. The concave mirrors have a symmetrical configuration and a central bore. Lenses (,to,) are mounted downstream of the mirrors (,) on the light path toward the image plane (,). Preferably, lenses (,to,) are moved at the object end forward into the intermediate space between the mirrors (,) in the region of the central bore. The light path between the concave mirrors can then preferably be free of lenses. The formation of an intermediate image (Z) downstream of the mirrors (,) affords especially good correction possibilities.