The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 02, 2001
Filed:
Sep. 03, 1999
Bernhard Platzer, Graz, AT;
Other;
Abstract
A device for producing RF/HF induced low-energy plasma, in particular noble gas plasma, including a generator and a supply element for the plasma gas. The generator is coupled in a known manner to two, in particular, ring- or disk-shaped parallel, interspaced electrodes, each having at least one through-opening, and for at least one isolator to be positioned between the electrodes, the isolator having at least one particularly circular through-opening assigned to the through-opening of the electrode, whose through-opening is designed to confine the plasma formed by a plasma gas at a pressure of at least 0.01 bars, but preferably between 0.1 and 5 bars. The inside diameter of the through-opening of the electrodes is at least double, but especially approximately four to eight times that of the inside diameter of the through-opening of the isolator for confining the plasma.