The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 02, 2001
Filed:
Nov. 29, 1999
Applicant:
Inventor:
Hidenori Shibata, Osaka, JP;
Assignee:
Matsushita Electric Industrial Co., Ltd., Kadoma, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F 9/00 ;
U.S. Cl.
CPC ...
G03F 9/00 ;
Abstract
A method for correcting a mask pattern for use in manufacturing of a semiconductor integrated circuit according to the invention comprises the steps of: sorting pattern units which compose a mask pattern, based on their respective shape and/or relative positional relationship with adjacent pattern units; selectively performing pattern correction on some of the pattern units which have been sorted out at the sorting step.