The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 02, 2001

Filed:

Jun. 25, 1999
Applicant:
Inventors:

Keishi Shimokawa, Wakayama, JP;

Takuya Imaki, Wakayama, JP;

Jun Shida, Wakayama, JP;

Naoki Nojiri, Wakayama, JP;

Shinobu Hiramatsu, Wakayama, JP;

Assignee:

Kao Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D 6/100 ;
U.S. Cl.
CPC ...
B01D 6/100 ;
Abstract

To provide a method for purification of the ionic polymer compound comprising efficiently removing low-molecular impurities, for example, ionic remaining monomers, which are charged identically to the ionic polymer compound from the ionic polymer compound in a shorter period of time. A method for purification of an ionic polymer compound, characterized by removing low-molecular impurities, such as ionic remaining monomers, by the use of an ultrafiltration membrane and/or a reverse osmosis membrane from an aqueous solution containing the ionic polymer compound and low-molecular impurities which are charged identically to the ionic polymer compound, under conditions that a concentration of the ionic polymer compound is from 7 to 20% by weight, and that an amount of charges of the ionic polymer compound in the aqueous solution is 0.30 gram-equivalent/liter or more.


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