The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 02, 2001
Filed:
Nov. 10, 1997
Masami Miyasako, Hiroshima, JP;
Hiroshi Horimoto, Hiroshima, JP;
Juki Corporation, Tokyo, JP;
Abstract
A pattern sewing machine which recognizes a reference point of a cloth in a cloth holding frame,by recognition means,, can space stitch point data of the current sewing pattern to be sewn in the cloth holding frame,at a predetermined pattern distance apart from the already formed embroidered pattern in X and Y directions by correction means,based on the reference point, detects a rotation direction shift of the cloth set in the cloth holding frame,by rotation direction shift detection means,, and corrects the stitch point data spaced at the predetermined pattern distance apart from the already formed embroidered pattern in the X and Y directions in the rotation direction with the reference point as the center by the correction means,based on the reference point and the cloth rotation direction shift, thereby finely matching the relative positions of the already formed sewing pattern and the subsequent sewing pattern to be sewn.