The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 26, 2000
Filed:
Mar. 07, 1997
Applicant:
Inventors:
Gregory Breyta, San Jose, CA (US);
Richard Anthony DiPietro, San Jose, CA (US);
Donald Clifford Hofer, San Martin, CA (US);
Hiroshi Ito, San Jose, CA (US);
Robert David Allen, San Jose, CA (US);
Juliann Opitz, San Jose, CA (US);
Thomas I Wallow, Union City, CA (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F / ; G03F / ;
U.S. Cl.
CPC ...
4302701 ; 430325 ; 430326 ; 430921 ; 430925 ;
Abstract
The invention relates to a polymeric, radiation-sensitive resist composition comprising (i) iodonium sulfonate radiation sensitive acid generator; (ii) a polymer; and (iii) an acid labile compound.