The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 26, 2000
Filed:
Apr. 12, 1999
Applicant:
Inventors:
Peter Lowell Ventzek, Austin, TX (US);
Daniel G Coronell, Austin, TX (US);
Michael J Hartig, Austin, TX (US);
John C Arnold, Austin, TX (US);
Assignee:
Motorola, Inc., Schumburg, IL (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ; C23C / ;
U.S. Cl.
CPC ...
427576 ; 20419211 ; 20419225 ; 20419212 ; 2041921 ; 20419217 ; 20419216 ; 20429812 ; 20429811 ; 20429806 ; 20429802 ; 427569 ; 427580 ; 427123 ; 427124 ; 4271261 ; 427526 ; 427527 ; 427531 ; 438758 ; 438584 ; 438579 ;
Abstract
A film is formed over a substrate using a physical vapor deposition method. When using ionized metal plasma physical vapor deposition, the deposition chamber configuration or operating parameters are adjusted to achieve the desired film characteristics. If the film is to be substantially uniform in thickness across a substrate, the deposition species density is made higher at locations away from the center of the substrate.