The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 19, 2000
Filed:
Apr. 15, 1999
Industrial Technology Research Institute, Hsinchu Hsien, TW;
Abstract
The invention provides a method for fabricating reflection-type light diffuser which is a substrate having a plurality of bumpy elements with reflective curved surfaces. Each of the plurality of bumpy elements having a first surface and a second surface, the first angle (.alpha. or .theta.) between the first surface and the substrate is different from the second angle (.beta. or .phi.) between the second surface and the substrate. A Multi-Exposure Shift Method along with specially designed masks are proposed for manufacturing the curved reflective elements in the present invention. The invention can also be used in a traditional TFT-LCD, with the diffusive film layer eliminated, as an element between the liquid crystal layer and the active matrix.