The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 19, 2000
Filed:
Jul. 16, 1998
Christopher E Obszarny, Poughkeepsie, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
An adjustable, in-situ photolithography process is taught, where incident exposure light is passed through two polarizers; the first polarizer capable of altering its polarization direction, during exposure, relative to the polarization direction of the second polarizer, in order to enhance the contrast of a patterned image projected on a semiconductor wafer. The second polarizer in the optical train is a photo mask transparent substrate impregnated with colloidal crystals that are aligned in a fixed, predetermined direction by magnetic field. The photo mask may also contain a silicon compound for phase shifting the incident exposure light to further enhance the image contrast.