The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 18, 2000
Filed:
Mar. 25, 1999
Makoto Kamioka, Kasuga, JP;
Matsushita Electric Industrial Co., Ltd., Osaka, JP;
Abstract
A multi-beam scanning optical apparatus employs a beam pitch adjusting system in which the position of a first beam is detected by using a beam position detecting system composed of a knife edge shaped plate and one photo sensor, and in which the optical path of the second beam is corrected so that the position of the second beam may be at a specified distance from the position of the first beam. A further embodiment of the beam pitch adjusting systems includes a beam position detecting system using a line position sensor by CCD or PSD. A yet further embodiment of the beam pitch adjusting system includes a position detecting system utilizing the power of a beam efficiently by disposing a focusing lens on an optical path of the beam. Hence, beam pitch adjustment is facilitated, the pitch adjustment precision is enhanced, the range of pitch adjustment is optimized, the number of parts is reduced, and space is saved.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile