The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 12, 2000
Filed:
Sep. 03, 1998
Stepan Essaian, San Jose, CA (US);
Daniel Henry Rosenblatt, San Carlos, CA (US);
National Semiconductor Corporation, Santa Clara, CA (US);
Abstract
Ion implantation of fluorine into SiO.sub.2 films results in formation of a dielectric material having a dielectric constant K.ltoreq.3.2. High energies associated with ion implantation permit stable introduction of high concentrations of fluorine within silicon oxide, without giving rise to problems of fluorine outgassing and water absorption associated with conventional FSG deposition techniques. Relatively thick FSG layers conventionally formed by CVD may be sandwiched between implanted FSG liner films formed in accordance with the present invention. Such a combination would reduce the dielectric constant of the dielectric structure as a whole while providing a barrier to fluorine diffusion, without consuming the processing time required to implant an entire dielectric layer.