The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 11, 2000
Filed:
Jun. 13, 1999
Guo-Fu Zhou, Eindhoven, NL;
U.S. Philips Corporation, New York, NY (US);
Abstract
A description is given of a rewritable optical information medium having an IPIAIM stack comprising a phase-change recording layer sandwiched between two dielectric layers, a light-absorbing layer of a material like Si, Ge, Mo, or W, a third dielectric layer, and a metal mirror layer. The light-absorbing layer reduces the difference in light absorption between the amorphous state and the crystalline state to a minimum, thus reducing the recording mark distortion. The presence of the light-absorbing layer in this position ensures that the optical phase difference between the amorphous and the crystalline state is almost zero, making the medium suitable for land-groove recording.