The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 12, 2000
Filed:
Oct. 12, 1999
John Charles Wolfe, Houston, TX (US);
James Richard Wasson, Houston, TX (US);
The University of Houston, Houston, TX (US);
Abstract
A method for producing a carbon film on a substrate, comprising the steps of (a) depositing a carbon layer of a predetermined thickness onto the substrate, e.g. using off-axis sputtering, the carbon layer having predominantly graphitic or amorphous structure, and (b) treating the carbon layer by means of an radio-frequency discharge in a helium atmosphere wherein the substrate is held at a negative dc bias voltage of a preselected value, where the thickness of the carbon layer deposited in step a) is chosen not greater than the longitudinal stop range of the helium ions corresponding to the bias voltage used in step b). After producing a first carbon layer of a predetermined thickness, a next carbon layer is likewise produced upon the first carbon layer and the procedure can be repeated until the total thickness of the layers attains a desired final thickness.