The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 12, 2000
Filed:
Jan. 11, 1995
Yoshinori Yoshimura, Shizuoka, JP;
Masaaki Iwasaki, Shizuoka, JP;
Sony Disc Technology Inc., Tokyo, JP;
Abstract
A magnetron sputtering apparatus for forming a thin metal film on one of the major surfaces of a light-transmitting disc-shaped substrate as a disc substrate for an optical disc as mutually intersecting magnetic fields are applied by a magnetic field application unit provided at back of a target. The apparatus includes a center mask tightly contacted with the outer peripheral portion of one major surface of the disc substrate on which the thin film is formed for masking the center portion of the substrate and an outer peripheral mask tightly contacted with the outer peripheral portion of the one major surface of the disc substrate on which the thin film is formed for masking the outer peripheral portion. The outer peripheral mask is separated from and independent of the center mask.