The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 05, 2000
Filed:
Jan. 16, 1996
Masato Kumazawa, Kawasaki, JP;
Nikon Corporation, Tokyo, JP;
Abstract
It is an object to provide a high-performance and compact exposure apparatus which can perform a projection exposure operation with satisfactory optical performance by using a plurality of compact projection optical systems each capable of ensuring a sufficient working distance and having excellent imaging performance, while preventing a decrease in throughput even in a large exposure area. An exposure apparatus for projecting and exposing an image of a mask onto a plate while moving a mask and a plate has a first projection optical system and a second projection optical system each of which is real-size and both-side telecentric and forms the erect image of the mask on the plate. The first or second projection optical system has a refraction optical system having a positive refracting power, and a concave reflecting mirror for reflecting a light beam from the refraction optical system toward the refraction optical system.