The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 05, 2000
Filed:
Oct. 27, 1997
Amir Doron, San Diego, CA (US);
Ronald A Askeland, San Diego, CA (US);
Michael M Chang, San Diego, CA (US);
Hewlett-Packard Company, Palo Alto, CA (US);
Abstract
A mask generation subroutine forms Z number of stacked n by m blank mask matrix arrays to provide a plurality of columnar mask locations. The subroutine then selects randomly any previously unselected column of mask locations from the stack of blank mask matrix arrays and assigns best print mode parameters to the individual mask locations in the selected column. The process of selecting and assigning is repeated until all columns of mask locations have been selected and all mask locations have been assigned best print mode parameters to provide a complete set of Z number of configured mask matrix arrays. A control program selects desired ones of the Z number of masks and applies the selected mask to control indicia patterns so that the depositing of indicia forming material in adjacent pixel locations is spaced in time to occur in different ones of the Z passes.