The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 05, 2000
Filed:
Sep. 18, 1998
Hao-Cheng Hung, Hsinchu County, TW;
Wen-Chi Chen, Taipei, TW;
Yu-Hsin Hu, Hsinchu, TW;
Chun-Hung Lu, Changhwa, TW;
Chunghwa Picture Tubes, Ltd., Yangmei/Taoyuan, TW;
Abstract
An apertured shadow mask in a color cathode ray tube (CRT) serves as a color selection electrode in permitting each of the three electron beams to be incident only upon its associated color-producing phosphor elements on the CRT's display screen. The apertures are arranged in vertical columns and horizontal rows in the shadow mask with aperture spacing defined by a vertical pitch (P.sub.v) i.e., the vertical spacing between adjacent apertures within the same vertical column where the apertures in one row are in different columns than the apertures in adjacent rows, and a horizontal pitch (P.sub.h), i.e., the horizontal spacing between adjacent apertures in the same horizontal row. To increase the color purity adjustment margin particularly in the corners of the display screen while still maintaining sufficient vertical spacing between adjacent phosphor dot color trios for a high degree of video image resolution, P.sub.v is defined in terms of a monotonic decreasing function in the horizontal direction and a monotonic increasing function in the vertical direction as follows: