The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 05, 2000
Filed:
Jan. 24, 2000
Applicant:
Inventor:
Russell F Jewett, Charlotte, NC (US);
Assignee:
Litmas, Inc., Matthews, NC (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
438715 ; 156345 ; 438714 ; 438729 ;
Abstract
The reliability of a plasma processing chamber has been increased using a heat moderating material to facilitate controlling heat removal from dielectric parts of the plasma chamber. The heat moderating material performs at least one of the functions: moderating heat transfer rate and functioning as a heat spreader. The heat moderating material allows removal of heat from the dielectric so that the dielectric maintains temperatures that result in negligible corrosion to the dielectric and the dielectric maintains temperature gradients that minimize thermal stress induced breakage of the dielectric.