The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 05, 2000

Filed:

Dec. 17, 1998
Applicant:
Inventor:

Kwang Jo Hwang, Kyoungki-do, KR;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ; H01L / ;
U.S. Cl.
CPC ...
438 30 ; 438158 ; 438159 ; 438720 ;
Abstract

A method of manufacturing an LCD requires only 4 masking while preventing undercutting of a semiconductor layer and includes the steps of etching a passivation layer, an a-Si layer and a gate insulating layer simultaneously by using CF.sub.4 /He gas. The flow ratio of the He gas to CF.sub.4 gas is preferably about 15% to about 35%.


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