The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 05, 2000
Filed:
Jan. 10, 1994
Applicant:
Inventors:
Naoki Takeyama, Settsu, JP;
Hiromi Ueki, Osaka, JP;
Yuji Ueda, Izumi, JP;
Takehiro Kusumoto, Takarazuka, JP;
Yuko Nakano, Ibaraki, JP;
Assignee:
Sumitomo Chemical Company, Limited, Osaka, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
4302701 ; 430326 ; 430905 ; 430910 ;
Abstract
The present invention provides a positive photoresist composition comprising an alkali-soluble resin containing a copolymer of p-vinylphenol or a derivative thereof and styrene, a dissolution inhibitor and a photo-induced acid precursor. This positive photoresist composition exhibits excellent sensitivity and resolution while maintaining excellence in other properties such as heat resistance, film thickness retention, adhesion and profile, in far ultraviolet ray lithography.