The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 05, 2000
Filed:
Aug. 24, 1998
Yasuhiro Shimada, Hadano, JP;
Takeo Yamazaki, Yokohama, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A projection having a micro-aperture is formed by formiNg a dent having a pointed front end on a substrate, then depositing a light blocking material on the substrate except the front end of the dent, and peeling off the light blocking material from the substrate. The projection is suited as an optical probe of scanning near-field optical microscope (SNOM) for detecting or emitting light through the micro-aperture. For this purpose, the projection is formed on the end of a cantilever or on the end of an optical fiber. The dent having a pointed front end can be formed typically by patterned crystal-axis-anisotropic etching of a silicon substrate and subsequent thermal oxidation of the silicon surface.