The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 05, 2000
Filed:
Sep. 01, 1998
Applicant:
Inventors:
Gary M Freeman, Macon, GA (US);
Sung-Tsuen Liu, Laguna Niguel, CA (US);
Assignee:
J. M. Huber Corporation, Edison, NJ (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C09C / ; C09C / ; C09C / ;
U.S. Cl.
CPC ...
106487 ; 106486 ; 106483 ; 106482 ; 106481 ;
Abstract
A method of preparing a polymer structured pigment slurry which comprises providing an anionic, aqueous slurry including a plurality of solid mineral particles, adding a low molecular weight, cationic polymer in an amount of less than about 0.20% by weight to the slurry and then adding a small amount of an inorganic dispersant to the polymer treated pigment slurry. The Malvern median particle size of the mineral particles treated with the polycationic polymer is less than about 20% larger than the Malvern median particle size of the untreated mineral particles.