The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 05, 2000
Filed:
Apr. 03, 1998
Applicant:
Inventor:
Joseph Neev, Laguna Beach, CA (US);
Assignee:
Y-Beam Technologies, Inc., Lake Forest, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
A61B / ;
U.S. Cl.
CPC ...
606 10 ; 606 11 ; 606 13 ; 606-2 ; 433 29 ; 433215 ; 2191216 ; 21912161 ; 216 94 ;
Abstract
A method and apparatus is disclosed for fast precise material processing and modification which minimizes collateral damage. Utilizing optimized, pulsed electromagnetic energy parameters leads to an interaction regime which minimizes residual energy deposition. Advantageously, removal of cumulative pulse train residual energy is further maximized through the rapid progression of the ablation front which move faster than the thermal energy diffusion front, thus ensuring substantial removal of residual energy to further minimize collateral thermal damage.
Published as: