The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 28, 2000
Filed:
Jan. 27, 2000
Applicant:
Inventors:
Stephan Wege, Weissig, DE;
Peter Lahnor, Dresden, DE;
Assignee:
Infineon Technologies AG, Munich, DE;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
438401 ; 438462 ;
Abstract
The invention describes a method for improving the readability of alignment marks on semiconductor wafers during multilayer metallization. Metal located in the alignment marks is etched back for the purpose of uncovering the edges of the alignment marks after the deposition of metal and subsequent CMP step. In the alternative, the oxide in the immediate vicinity of the alignment marks is etched back in a recess etching step until the metal in the alignment mark is partly uncovered.