The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 28, 2000

Filed:

May. 20, 1997
Applicant:
Inventors:

Leonid M Blumberg, Hockessin, DE (US);

Bruce D Quimby, Lincoln University, PA (US);

Matthew S Klee, Wilmington, DE (US);

Assignee:

Hewlett-Packard Company, Palo Alto, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N / ;
U.S. Cl.
CPC ...
436161 ; 73 2325 ; 73 2327 ; 73 2336 ; 95 82 ; 95 87 ;
Abstract

A method for identifying analytes of interest by referencing to a retention factor database corresponding to a plurality of identified analytes that is independent of column dimensions and carrier gas type while dependent upon stationary phase type ratio and a relative temperature program. The retention factor database is generated on a reference GC system in which the column head pressure is adjusted to ensure high reproducibility of retention times by locking the column void time and/or the retention time of an identified analyte to a specific value such that accurate retention factors (k) can be calculated in accordance with the formula: ##EQU1## where VT is the void time of the column having a specified stationary phase and phase coating installed in a GC system operating in accordance to a specified temperature program (where time is expressed in units of column void time).


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