The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 28, 2000
Filed:
Jan. 16, 1996
Heinz Bauscher, Langenselbold, DE;
Klaus Ruppert, Maintal, DE;
Heraeus Quarzglas GmbH & Co KG, Hanau, DE;
Abstract
An equalization chamber has a first plurality of gas inlet openings for a gas stream and a second plurality of gas outlet openings for partial gas streams, each outlet being connected by way of a gas line to a gas consumer, the maximum flow resistance for each partial gas stream being located in the area under the gas outlet openings, seen in the flow direction of the partial gas streams. To guarantee the highest possible degree of uniformity and reproducibility of the gas supply to the consumers, the maximum flow resistance for each partial gas stream is provided in the gas line between the gas outlet opening and the gas consumer.