The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 21, 2000
Filed:
Sep. 10, 1998
Hiroshi Oku, Wakayama, JP;
Noritsu Koki Co., Ltd., Wakayama, JP;
Abstract
A negative mask unit which can perform exposure from either of reference film or new-type film simply by changing the direction of insertion of the negative film. The negative mask unit has a negative film feed passage provided between a base plate and a top plate. The film feed passage is composed of first to third feed passages. A negative mask is exchangeably set between the first and third feed passages. Two sets of mask-related members necessary to process reference film (135 film) and new-type film, including a film inlet, feed means, and sensors, are provided on one and the other sides of the negative mask, respectively. One of the sets is selected and film is inserted from the side of the selected set for exposure.