The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 21, 2000
Filed:
Mar. 30, 1998
James Lupton Hedrick, Pleasanton, CA (US);
Charles Mathew Mate, San Jose, CA (US);
Junhua Wu, San Jose, CA (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
Reactive monomers of cyanate esters are vapor deposited onto thin film disks used for magnetic recording. The monomer films are then irradiated with ultraviolet (UV) light to polymerize the deposited monomer to form a solid, robust polycyanate ester overlayer on the disk that becomes smoother, more corrosion resistant and, when lubricated, more durable than disks without the overlayer. The polycyanate ester overlayer can either replace the conventional carbon overcoat or allow a substantially thinner carbon overcoat to be used.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile